曲靖师范学院学报 ›› 2021, Vol. 40 ›› Issue (3): 22-28.

• 物理学研究 • 上一篇    下一篇

不同温度及外加磁场方向外延生长Ni-Mn-Ga薄膜的磁性能研究

姜钟生, 杨波, 闫海乐, 李宗宾   

  1. 东北大学 材料科学与工程学院材料各向异性与织构教育部重点实验室,辽宁 沈阳 110819
  • 收稿日期:2021-04-26 出版日期:2021-05-26 发布日期:2021-07-13
  • 通讯作者: 杨 波,东北大学材料科学与工程学院副教授,主要从事铁磁形状记忆合金薄膜晶体学与磁性能研究.
  • 作者简介:姜钟生,东北大学材料科学与工程学院在读硕士研究生,主要从事铁磁形状记忆合金薄膜的制备与磁性能研究.
  • 基金资助:
    国家自然科学面上基金“外延生长Ni-Mn-Ga薄膜的马氏体相变与磁化行为机理研究”(52071071).

Study of Magnetic Properties of Ni-Mn-Ga Thin Films Epitaxially Grown at Different Temperatures and Applied Magnetic Field Directions

JIANG Zhongsheng, YANG Bo, YAN Haile, LI Zongbin   

  1. Key Laboratory of Material Anisotropy and Weave, School of Material Science and Engineering, Ministry of Education, Northeastern University, Shenyang Liaoning 110819, China
  • Received:2021-04-26 Published:2021-05-26 Online:2021-07-13

摘要: 外延生长Ni-Mn-Ga哈斯勒合金薄膜具有多种优异的磁控功能行为,是智能传感驱动、新型固态制冷等领域中极具前景的候选材料.利用磁控溅射在MgO(001)单晶基板上制备出外延生长Ni-Mn-Ga薄膜,X射线衍射和微观组织表征结果显示其在室温下为七层调制结构马氏体.通过测量MgO(001)基板上外延生长Ni-Mn-Ga薄膜在不同温度和不同磁场方向的磁滞回线发现,当温度低于330 K时,在其磁滞回线上能够观察到明显的“磁矩跳跃”现象(磁化强度的突变),并且随温度降低该现象越明显;当温度高于335 K时,薄膜的磁滞回线为常规磁性材料的磁滞回线,说明“磁矩跳跃”现象只存在于马氏体状态.通过研究不同施加磁场方向的磁滞回线发现,薄膜磁滞回线上的“磁矩跳跃”现象对外加磁场方向也非常敏感,只有当外加磁场靠近MgO单晶基板的[100]或[010]方向时,薄膜的磁滞回线才会存在明显的“磁矩跳跃”现象.

关键词: 外延生长Ni-Mn-Ga薄膜, 磁化行为, 磁场诱发马氏体变体重取向, 热-磁曲线, 磁滞回线

Abstract: Epitaxially grown Ni-Mn-Ga Hassler alloy thin films have a variety of excellent magnetron functional behaviors and are promising candidates for smart sensing drives and new solid-state refrigeration. In this study, epitaxially grown Ni-Mn-Ga thin films were prepared on MgO(001) single crystal substrates using magnetron sputtering, and X-ray diffraction and microstructure characterization results showed that they were seven-layer modulated structured martensite at room temperature. By measuring the hysteresis lines of the epitaxially grown Ni-Mn-Ga films on MgO(001) substrates at different temperatures and magnetic field directions, it was found that when the temperature was below 330 K, a significant “magnetic moment jump” phenomenon (sudden change of magnetization intensity) could be observed in the hysteresis lines, and the phenomenon became more pronounced as the temperature decreased. When the temperature is higher than 335 K, the hysteresis line of the film is the hysteresis line of the conventional magnetic material, which means that the “moment jump” phenomenon exists only in the martensitic state. By studying the hysteresis lines in different directions of the applied magnetic field, we found that the “moment jump” phenomenon in the hysteresis lines of thin films is also very sensitive to the direction of the applied magnetic field, and only when the applied magnetic field is close to the [100] or [010] direction of the MgO single-crystal substrate, the hysteresis lines of thin films will have obvious “moment jump” phenomenon. The “magnetic moment jump” phenomenon is only apparent when the applied magnetic field is close to the [100] or [010] direction of the MgO single crystal substrate.

Key words: epitaxially grown Ni-Mn-Ga thin films, magnetization behavior, magnetic field-induced martensitic variable weight orientation, thermal-magnetic curve, hysteresis line

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